Facilities

The nanodevices group has access to nanoGUNE common clean-room equipment devoted to nanofabrication.
In adittion, we have some equipment specially dedicated to our current research lines:

Deposition machines:
Ultra High Vacuum metal and organic materials evaporator
High vacuum e-beam and thermal metal evaporator
High vacuum metal sputtering
Atomic layer deposition

Nanofabrication:
Electron Beam Litography
Photolithography Mask Aligner
Ion Beam Milling

Characterization:
Variable Temperature Probe Station with in-plane magnetic field
Physical Properties Measurement System
X-Ray Diffractometer
Atomic Force Microscope

Ultra high vacuum metal and organic materials evaporator Growth of high-quality ultrathin films and multilayers

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Theva Evaporator

Load Lock chamber with Ar plasma and heater treatment

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Theva Evaporator

High Vacuum metal evaporator

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Oerlikon Evaporator

High Vacuum metal sputtering

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Leica Sputtering

Atomic layer deposition

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Cambridge Nanotech Savannah S100

Electron beam lithography Ultra high resolution direct write and metrology tool

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Raith 150 TWO.

Submicron optical lithography

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EVG mask aligner.

Ion Beam Etching and Sputtering system.

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4Wave Ion Beam Etching

Probe station with variable temperature and magnetic field. High-resolution and sensitivity measuraments of magnetic properties. Low temperature and high-field measurements of physical properties. Electrical characterization of ultrathin films and nanodevices.

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Lake Shore Probe Station.

Low temperature characterization PPMS

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Quantum Design PPMS

X-Ray Diffractometer

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X’Pert PRO PANalytical

Atomic Force Microscope

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Agilent AFM