Nanodevices group (CIC5)
Facilities
The nanodevices group has access to nanoGUNE common clean-room equipment devoted to nanofabrication.
In adittion, we have some equipment specially dedicated to our current research lines:
Deposition machines:
Ultra high vacuum metal and organic materials evaporator
MBE Createc
High vacuum e-beam and thermal metal evaporator
7 gun AJA Sputter
High vacuum metal sputtering
Atomic layer deposition
Nanofabrication:
Electron beam litography
Photolithography mask aligner
Ion beam milling
Reactive ion etching
Characterization:
Variable temperature probe station with in-plane magnetic field
Physical properties measurement system
X-Ray diffractometer
Atomic force microscope
Ultra high vacuum metal and organic materials evaporator.
3KW 4 pockets e-beam, 3 Knudsen cells. Growth of high-quality ultrathin films.
Theva evaporator
Load lock chamber with O2-Ar plasma and heater treatment
Theva evaporator
MBE evaporator – 10KW e-gun 4 pockets – 4 metal effusion cell – 1 Aluminum effusion cell
Createc
High vacuum metal evaporator
Oerlikon evaporator
7 magnetrons AC and DC – mass spectrometer – LN2 cold trap
AJA sputtering
High vacuum metal sputtering
Leica sputtering
Atomic layer deposition
Cambridge Nanotech Savannah S100
Electron beam lithography
Ultra high resolution direct write and metrology tool
Raith 150 TWO.
Submicron optical lithography
EVG mask aligner.
Ion beam etching and 3 magnetrons DC-AC sputtering system.
4Wave Ion beam etching
Reactive ion etching – 8” sample – CF4,SF6,CHF3,O2 gases
RIE Oxford Plasmalab 80 Plus
Probe station with variable temperature and magnetic field. High-resolution and sensitivity measuraments of magnetic properties. Low temperature and high-field measurements of physical properties. Electrical characterization of ultrathin films and nanodevices.
Lake Shore probe station.
Low temperature characterization PPMS
Quantum Design PPMS
X-Ray diffractometer
X’Pert PRO PANalytical
Atomic force microscope
Agilent AFM
