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UHV Sputtering System (AJA Int.)

We have two UHV Magnetron Sputtering system for high quality single or multiple layer thin film growth, one in the cleanroom and another one in the Deposition Laboratory.

 

Offered as External Service
  • Confocal 7 magnetron sputtering guns (DC / RF)
  • RF bias available
  • Base pressure 10-8 Torr
  • Sample holder: 4” compatible and possibility to heat (up to 850 °C) or cool the sample (liquid nitrogen cooler)
  • Reactive gasses: nitrogen and oxygen

 

Research Groups: 
Related Sectors: 
Automotive industry
Glass coatings
Iron and steel industry
Machine tool manufacturers
Metallurgy
Microelectronics and semiconductor industry
Off-shore industry
Solar cell industry
Cleanroom: 
CR4 - Deposition Bay
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