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Dual-beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S

Focused Ion Beam (FIB) and Focused electron/ion beam induced deposition (FE(I)BID), system used for surface patterning and complex structures fabrication.

Offered as External Service
  • High tension electron column 50 V - 30 kV
  • High tension Ga-column 0.5 kV – 30 kV
  • Electron column resolution 0.5 nm at 15 kV and 0.8 nm at 1 kV (STEM)
  • FIB milling resolution 10 nm at 30 kV
  • GIS percursor for FE(I)BID: platinum, silicon oxide, gold, tungsten, cobalt
  • Nanomanipulator with microgripper (Kleindiek)
  • LN2 cooling stage (CryoMat )
  • EDX silicon drift detectors for elemental analysis (EDAX)
  • Detectors: ETD SE, True in-Lens Detector (TLD), STEM II detector, High performance Ion Conversion and Electron (ICE), Concentric Back Scatter (CBS) detector
  • iFast software for advanced Dual Beam automation in order to automate the imaging and nanofabrication
  • MAPSTM for automatic acquisition of extra large images with high resolution
  • AutoSlice&ViewTM software for 3D imaging by sequential sectioning of the sample
Related Sectors: 
Automotive industry
Glass coatings
Laboratory test facility
Microelectronics and semiconductor industry
Microscopy laboratories
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