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Mask aligner (EVG)

Mask aligner photograph

Optical Lithography for microstructure fabrication.

Offered as External Service
  • Possibility of contact and proximity optical lithography process
  • Easily minimum size achievable of 5 μm
  • Possibility to pattern areas of up to 4” wafers
  • Wide range of mask types
  • UV lamp (15 mW /cm2)
Research Groups: 
Related Techniques: 
Related Sectors: 
Automotive industry
Laboratory test facility
Microelectronics and semiconductor industry
Cleanroom: 
CR2 - Photo Bay
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