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RAMGRABER Wet benches

Sample processing stations specialized for chemical and lithography processes.

No
  • 5 wet benches: 2 acid wet benches, 2 solvents wet benches and 1 basis wet bench.
  • Ultrasonic bath sonicators with variable power and temperature
  • Spin coaters maximum 8000 rpm (4” substrates)
  • Hot plates maximum temperature 300 ºC (4” substrates)
  • Pure N2 gas guns
  • DI water guns
  • Overflow sinks
Cleanroom: 
CR2 - Photo Bay
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