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ALD4MAX- Atomic Layer deposition For tailored bottom-top growth of MAX and MXene films

ALD4MAX- Atomic Layer deposition For tailored bottom-top growth of MAX and MXene films

Funding Program: 
EU - Horizon 2020
ERA.NET
Coordinator: 
University of Minho - Portugal
Call: 
M-ERA.NET Call 2016
Project ID: 
4214
PI at nanoGUNE: 
Mato Knez- m.knez@nanogune.eu
From: 
01/09/2017
To: 
31/08/2020
Total funding: 
645.000,00 €
Contribution to nanoGUNE: 
150.000,00 €
Research: 
Atomic Layer Deposition For tailored bottom-top growth of MAX and MXene films.
Atomic Layer Deposition