RAMGRABER Wet benches

RAMGRABER Wet benches

Sample processing stations specialized for chemical and lithography processes.

Technical characteristics
  • 5 wet benches: 2 acid wet benches, 2 solvents wet benches and 1 basis wet bench.
  • Ultrasonic bath sonicators with variable power and temperature
  • Spin coaters maximum 8000 rpm (4” substrates)
  • Hot plates maximum temperature 300 ºC (4” substrates)
  • Pure N2 gas guns
  • DI water guns
  • Overflow sinks
Cleanroom
CR2 - Photo Bay

Cleanroom

The nanoGUNE cleanroom, dedicated to fabricate and characterize the properties of materials on the nanoscale, ia a 300m2 laboratory where the air purity is under strict supervision.

Equipment

State-of-the-art equipment, including electron and scanning-tunneling microscopes, as well as other nanofabrication and characterization tools, are managed by specialists and used by researchers from a wide variety of fields.