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NEW PATENT GRANTED FOR A TECHNOLOGY DEVELOPED AT NANOGUNE AND KEY TO ITS SPIN-OFF 'CTECH NANO'

NEW PATENT GRANTED FOR A TECHNOLOGY DEVELOPED AT NANOGUNE AND KEY TO ITS SPIN-OFF 'CTECH NANO'

31/03/2020

Atomic layer deposition (ALD) is a technique used to deposit very thin layers of material in coatings to improve a given physical property or the mechanical properties of a material. This technology is very versatile and useful, but it has been found that the design of chambers for ALD processes, generally oriented to 2D substrates, e.g. silicon wafers as used in microelectronics, does not allow the deposition on complex shaped substrates that may have large sizes or non-geometric shapes (e.g. implants, fibers, and metallurgical parts).

The inventors at nanoGUNE have developed a camera that allows deposition on irregular surfaces and the patent application has recently been granted (March 3, 2020 granted by the Spanish Patent and Trademark Office (SPTO), patent application 201990026). Daniel Simó, CEO of Ctech Nano, spin-off company of nanoGUNE and licensee of the patent application, assures that "the protection of the technology is key for a robust and safe development of the business model of the company".

This concession enriches the nanoGUNE patent portfolio (with a link to https://www.nanogune.eu/ip-portfolio ), with 5 families of patents and 19 families of ongoing applications. granted