Nanomaterials Equipment
Experimental work in the Nanomaterials group is performed by means of equipment specially dedicated to our research lines. The group has also access to nanoGUNE's common facilities and equipment, including a cleanroom of nearly 300 m2 and the Electron-Microscopy Laboratory.
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Ion Beam Etcher (4Wave) -
Quantum Design SQUID-VSM EverCool -
Magneto-Optical Kerr Effect (MOKE) set-up -
Electron-Beam Lithography (Raith -150-TWO / E-line) -
Magneto-Optical Kerr Effect (MOKE) microscope -
Electron-Beam Lithography (Raith -150-TWO / E-line)
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UHV Sputtering System (AJA Int.) -
Dual-beam FIB/SEM (Focused Ion Beam and Induced deposition) -
X-ray reflectivity/diffractometry (Malvern - PANalytical) -
UHV Sputtering System (AJA Int.)
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Dual-beam FIB/SEM (Focused Ion Beam and Induced deposition)
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X-ray reflectivity/diffractometry (Malvern - PANalytical)
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E-Beam and thermal evaporation - Lesker -
X-ray reflectivity/diffractometry (Malvern - PANalytical)
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E-Beam and thermal evaporation - Lesker
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Quantum Design PPMS -
ALD Cambridge Nanotech Savannah S100 -
Quantum Design PPMS
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Electron-Beam Lithography (Raith -150-TWO / E-line)
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Environmental Scanning-electron Microscope (eSEM-FEI Quanta 250) -
High power industrial Picosecond Laser -
High-resolution Transmission Electron Microscope (HRTEM) -
Four point probe -
STM/AFM (4 K) in UHV with light detection set-up -
STM/AFM (1 K) in UHV with magnetic field -
Mask aligner (EVG) -
Electrospinning -
Mask aligner (EVG)
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Reactive ion etcher (RIE Oxford Plasmalab 80 Plus) -
Environmental Scanning-electron Microscope (eSEM-FEI Quanta 250)
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ALD Beneq TFS 200 -
Environmental Scanning-electron Microscope (eSEM-FEI Quanta 250)
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FTIR Spectrometer PerkinElmer Frontier -
Microscopy Platform for Materials Research -
UV-NIR Spectrometry -
3D Optical Profiler -
Surface Plasmon Resonance Platform -
NIR Raman spectroscopy -
Scattering-type near-field microscope (Neaspec) -
CRYO Plasma FIB