ALD Cambridge Nanotech Savannah S100

ALD Cambridge Nanotech photograph
Offered as External Service

Atomic Layer Depostion (ALD ), Evaporation thecnique for deposition of wide variety of materials (Al2O3, HfO2, ZnO, TiO2 and other oxides, nitrides and metals) on flat substrates (e.g. Si wafer) or high aspect ratio substrates (porous foams, fibers….)

Research group
Technical characteristics
  • ''Exposure mode'’ for deposition of conformal and uniform films on substrates with ultra high aspect ratios, greater than 2000:1
  • ''Continuous mode'' for perfectly dense, uniform and conformal films.
  • 4 precursor sources (heated up to 150 ºC) and option of using O3
  • Sample holder: 4” compatible and possibility to heat up to 300 °C
CR3 - Etching Bay


The nanoGUNE cleanroom, dedicated to fabricate and characterize the properties of materials on the nanoscale, ia a 300m2 laboratory where the air purity is under strict supervision.


State-of-the-art equipment, including electron and scanning-tunneling microscopes, as well as other nanofabrication and characterization tools, are managed by specialists and used by researchers from a wide variety of fields.