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Equipment
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Characterization platform
Sample-fabrication platform
Direct Laser Writer
CRYO Plasma FIB
Plasma asher
Atomic-Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
FTIR Spectrometer PerkinElmer Frontier
Scattering-type near-field microscope (NeaSpec)
High power industrial Picosecond Laser
Four point probe
Mask aligner (EVG)
Environmental Scanning-electron Microscope (eSEM-FEI Quanta 250)
High-resolution Transmission Electron Microscope (HRTEM)
Reactive ion etcher (RIE Oxford Plasmalab 80 Plus)
X-ray reflectivity/diffractometry (X'pert PRO by PANalytical)
Quantum Design PPMS
UHV Sputtering System (AJA Int.)
Oerlikon - UNIVEX 350 / EPVD75 Kurt J. Lesker
ALD Cambridge Nanotech Savannah S100
Electron-Beam Lithography (Raith -150-TWO / E-line)
Dual-beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S
Atomic-Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
