Pasar al contenido principal
en
es
eu
User account menu
Iniciar sesión
Main Menu ES
nanoGUNE
De un vistazo
Organización y Financiación
Personas
Únete
Vive
Sala de prensa
nanoPeople
Investigación
Investigación
Publicaciones
Proyectos
Servicios externos
Transferencia
Transferencia
Start-ups
Cartera PI
Industry collaborative research positions
Strategic lines
Servicios externos
Noticias
Formación
Master projects
Bachelor Final Projects
Prácticas de verano
Programa de doctorado
Sociedad
User menu
Iniciar sesión
Inicio
Equipment
View all
Characterization platform
Sample-fabrication platform
Direct Laser Writer
CRYO Plasma FIB
Plasma asher
Atomic-Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
FTIR Spectrometer PerkinElmer Frontier
Scattering-type near-field microscope (NeaSpec)
Four point probe
Mask aligner (EVG)
Environmental Scanning-electron Microscope (eSEM-FEI Quanta 250)
High-resolution Transmission Electron Microscope (HRTEM)
Reactive ion etcher (RIE Oxford Plasmalab 80 Plus)
High power industrial Picosecond Laser
Quantum Design PPMS
UHV Sputtering System (AJA Int.)
Oerlikon - UNIVEX 350 / EPVD75 Kurt J. Lesker
ALD Cambridge Nanotech Savannah S100
Electron-Beam Lithography (Raith -150-TWO / E-line)
Dual-beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S
Atomic-Force Microscope (AFM 5500 Agilent/Nano observer CSI Instruments)
X-ray reflectivity/diffractometry (X'pert PRO by PANalytical)
