Mask aligner (EVG)

Mask aligner photograph
Offered as External Service

Optical Lithography for microstructure fabrication.

Research group
Technical characteristics
  • Possibility of contact and proximity optical lithography process
  • Easily minimum size achievable of 5 μm
  • Possibility to pattern areas of up to 4” wafers
  • Wide range of mask types
  • UV lamp (15 mW /cm2)
CR2 - Photo Bay
Related Techniques


The nanoGUNE cleanroom, dedicated to fabricate and characterize the properties of materials on the nanoscale, ia a 300m2 laboratory where the air purity is under strict supervision.


State-of-the-art equipment, including electron and scanning-tunneling microscopes, as well as other nanofabrication and characterization tools, are managed by specialists and used by researchers from a wide variety of fields.