ALD Cambridge Nanotech Savannah S100

ALD Cambridge Nanotech photograph

Atomic Layer Depostion (ALD ), Evaporation thecnique for deposition of wide variety of materials (Al2O3, HfO2, ZnO, TiO2 and other oxides, nitrides and metals) on flat substrates (e.g. Si wafer) or high aspect ratio substrates (porous foams, fibers….)

Offered as External Service
Research group

What we can offer:

  • High quality ceramic and hybrid (organic-inorganic) coatings.
  • Possibility to coat a wide variety of substrates, glass, silicon, polymers...


  • Improve the mechanical properties of materials (hardness, corrosion, wear, friction, adhesion...)

  • Anti-reflecting coatings

  • Biocompatible coatings

  • Decorative coatings

  • Standard fabrication for coating systems calibration

  • Multilayers for sensing and metrology

Interesting for (with the system):

Solar cell industry, biotech, off-shore industry, glass coatings, microelectronics and microsystems, automotive industry, iron ad steel industry, metallurgy, machine tool manufacturers...

Technical characteristics
  • ''Exposure mode'’ for deposition of conformal and uniform films on substrates with ultra high aspect ratios, greater than 2000:1
  • ''Continuous mode'' for perfectly dense, uniform and conformal films.
  • 4 precursor sources (heated up to 150 ºC) and option of using O3
  • Sample holder: 4” compatible and possibility to heat up to 300 °C
External services type
CR3 - Etching Bay
External services title
Atomic layer depositon (ALD)