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ALD Cambridge Nanotech Savannah S100

ALD Cambridge Nanotech Savannah S100

ALD Cambridge Nanotech photograph

Atomic Layer Depostion (ALD ), Evaporation thecnique for deposition of wide variety of materials (Al2O3, HfO2, ZnO, TiO2 and other oxides, nitrides and metals) on flat substrates (e.g. Si wafer) or high aspect ratio substrates (porous foams, fibers….)

Offered as External Service
  • ''Exposure mode'’ for deposition of conformal and uniform films on substrates with ultra high aspect ratios, greater than 2000:1
  • ''Continuous mode'' for perfectly dense, uniform and conformal films.
  • 4 precursor sources (heated up to 150 ºC) and option of using O3
  • Sample holder: 4” compatible and possibility to heat up to 300 °C
Research Groups: 
Related Sectors: 
Automotive industry
Glass coatings
Iron and steel industry
Laboratory test facility
Machine tool manufacturers
Material science industry
Metallurgy
Microelectronics and semiconductor industry
Off-shore industry
Solar cell industry
Cleanroom: 
CR3 - Etching Bay
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