Mask aligner (EVG)

Mask aligner photograph

Optical Lithography for microstructure fabrication.

Offered as External Service
Research group

What we can offer:

Micro structure fabrication


  • Micro and nano structures and devices on different substrates (glass, silicon, CaF2)

  • Customized structured calibration and reference samples (microscopy, metrology).

Interesting for (with the system):

Material science, microelectronics and semiconductors, automotive, laboratory test facilities, microscopy laboratories, machine tool manufacturers, iron and steel industry...

Technical characteristics
  • Possibility of contact and proximity optical lithography process
  • Easily minimum size achievable of 5 μm
  • Possibility to pattern areas of up to 4” wafers
  • Wide range of mask types
  • UV lamp (15 mW /cm2)
External services type
CR2 - Photo Bay
Related Techniques
External services title