Mask aligner (EVG)
Optical Lithography for microstructure fabrication.
Offered as External Service
Research group
What we can offer:
Micro structure fabrication
Possibility:
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Micro and nano structures and devices on different substrates (glass, silicon, CaF2)
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Customized structured calibration and reference samples (microscopy, metrology).
Interesting for (with the system):
Material science, microelectronics and semiconductors, automotive, laboratory test facilities, microscopy laboratories, machine tool manufacturers, iron and steel industry...
Technical characteristics
- Possibility of contact and proximity optical lithography process
- Easily minimum size achievable of 5 μm
- Possibility to pattern areas of up to 4” wafers
- Wide range of mask types
- UV lamp (15 mW /cm2)
External services type
Equipment
Cleanroom
CR2 - Photo Bay
Related Techniques
External services title
Photolithography