Microsite es: . Grupo:
You are here

Dual-beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S

Dual-beam FIB/SEM - FEI Helios Nanolab / FEI Helios 450S

Focused Ion Beam (FIB) and Focused electron/ion beam induced deposition (FE(I)BID), system used for surface patterning and complex structures fabrication.

Offered as External Service
  • High tension electron column 50 V - 30 kV
  • High tension Ga-column 0.5 kV – 30 kV
  • Electron column resolution 0.5 nm at 15 kV and 0.8 nm at 1 kV (STEM)
  • FIB milling resolution 10 nm at 30 kV
  • GIS percursor for FE(I)BID: platinum, silicon oxide, gold, tungsten, cobalt
  • Nanomanipulator with microgripper (Kleindiek)
  • LN2 cooling stage (CryoMat )
  • EDX silicon drift detectors for elemental analysis (EDAX)
  • Detectors: ETD SE, True in-Lens Detector (TLD), STEM II detector, High performance Ion Conversion and Electron (ICE), Concentric Back Scatter (CBS) detector
  • iFast software for advanced Dual Beam automation in order to automate the imaging and nanofabrication
  • MAPSTM for automatic acquisition of extra large images with high resolution
  • AutoSlice&ViewTM software for 3D imaging by sequential sectioning of the sample
Related Sectors: 
Automotive industry
Glass coatings
Laboratory test facility
Microelectronics and semiconductor industry
Microscopy laboratories
x
We use third party cookies to analyze our services and show you advertising related to your preferences based on a profile drawn up from your browsing habits (e.g. pages visited). If you continue to browse, we will consider your acceptance of their use. You can set or reject the use of cookies or obtain more information HERE.