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Oerlikon - UNIVEX 350 / EPVD75 Kurt J. Lesker

Oerlikon - UNIVEX 350 / EPVD75 Kurt J. Lesker

Oerlikon photograph

E-beam/Thermal Evaporator for single or multiple layer thin film growth

Offered as External Service
  • Multi pocket e-beam and thermal evaporation.
  • Deposited thickness control by quartz crystal monitor.
  • Deposition pressure of 10-6 - 10-7 mbar.
  • Sample holder: 4” compatible and possibility to heat up to 350 °C
Research Groups: 
Related Sectors: 
Automotive industry
Glass coatings
Iron and steel industry
Laboratory test facility
Machine tool manufacturers
Material science industry
Metallurgy
Microelectronics and semiconductor industry
Off-shore industry
Solar cell industry
Cleanroom: 
CR4 - Deposition Bay
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